紫外纳秒脉冲激光烧蚀单晶硅表面特征创成机制

doi:10.7527/S1000-6893.2021.25341

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紫外纳秒脉冲激光烧蚀单晶硅表面特征创成机制

张全利, 储成龙, 翟健超, 王昱凯, 张振, 徐九华

南京航空航天大学机电学院, 南京 210016

收稿日期:2021-01-29 修回日期:2021-03-05 发布日期:2021-04-29
通讯作者: 张全利 E-mail:zhangql@nuaa.edu.cn
基金资助:
中国博士后科学基金（2019TQ0151）；南京航空航天大学研究生创新基地（实验室）开放基金（KFJJ20200518）

Surface characteristics formation mechanism of ablated monocrystalline silicon by UV nanosecond pulsed laser

ZHANG Quanli, CHU Chenglong, ZHAI Jianchao, WANG Yukai, ZHANG Zhen, XU Jiuhua

College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing 210016, China

Received:2021-01-29 Revised:2021-03-05 Published:2021-04-29
Supported by:
China Postdoctoral Science Foundation (2019TQ0151); Open Foundation of Graduate Innovation Center in Nanjing University of Aeronautics and Astronautics (KFJJ20200518)

摘要/Abstract

摘要： 脉冲激光表面微织构技术可以有效改善单晶硅表面磨擦特性、光学反射率以及亲疏水性等，拓宽了单晶硅的使用范围。为加工出均匀的表面织构，基于激光与物质的相互作用，开展了紫外纳秒激光加工单晶硅表面阵列织构的试验研究。采用面积法计算了单晶硅紫外纳秒激光烧蚀阈值，并通过单因素法研究了激光输出功率、脉冲重复频率、光斑扫描速度以及扫描次数对加工沟槽宽度和深度的影响规律，分析了烧蚀沟槽典型形貌特征及形成机制，获得了工艺参数对微结构特征的影响规律。最后，基于优化的工艺参数，在单晶硅表面加工了点阵、方形阵列、正六边形阵列、正弦波阵列以及螺旋线等表面结构。

关键词: 纳秒脉冲激光, 单晶硅, 材料去除机理, 表面特征, 表面织构

Abstract: Laser surface microstructures of monocrystalline silicon can effectively improve the surface friction characteristics, optical reflectivity and hydrophobicity of the material, broadening the application range of monocrystalline silicon. To obtain a good surface texture, an experimental study on the surface array texture of monocrystalline silicon processed by Ultraviolet (UV) nanosecond laser was carried out based on analysis of the interaction mechanism between laser and material in this paper. The area method is applied to calculate the ablation threshold of monocrystalline silicon by the UV nanosecond laser. Subsequently, the influences of the parameters including the laser output power, pulse repetition frequency, spot scanning speed and number of scanning times on the groove width and depth were studied by the single factor method. The typical morphology characteristics and formation mechanism of the ablated groove were analyzed, and the influences of process parameters on microstructure characteristics were obtained. With the selected processing parameters, the microstructures including the lattice structure, square array, hexagon array, sine wave array and helix structure were fabricated on the surface of monocrystalline silicon.

Key words: nanosecond pulsed laser, monocrystalline silicon, material removal mechanism, surface characteristics, surface microstructures

中图分类号:

V261.8
TN249

张全利, 储成龙, 翟健超, 王昱凯, 张振, 徐九华. 紫外纳秒脉冲激光烧蚀单晶硅表面特征创成机制[J]. 航空学报, 2022, 43(4): 525341-525341.

ZHANG Quanli, CHU Chenglong, ZHAI Jianchao, WANG Yukai, ZHANG Zhen, XU Jiuhua. Surface characteristics formation mechanism of ablated monocrystalline silicon by UV nanosecond pulsed laser[J]. ACTA AERONAUTICAET ASTRONAUTICA SINICA, 2022, 43(4): 525341-525341.

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E-mail：hkxb@buaa.edu.cn

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紫外纳秒脉冲激光烧蚀单晶硅表面特征创成机制

Surface characteristics formation mechanism of ablated monocrystalline silicon by UV nanosecond pulsed laser

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