导航

ACTA AERONAUTICAET ASTRONAUTICA SINICA ›› 2007, Vol. 28 ›› Issue (增): 174-177.

Previous Articles     Next Articles

Effects of Different Conditions on the Growth of TiO2 Thin Films Prepared by AP-MOCVD

LI;Li-na,GU;Jing-hua,ZHANG;Yue   

  1. School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics
  • Received:2006-10-25 Revised:2007-01-16 Online:2007-08-10 Published:2007-08-10
  • Contact: ZHANG Yue

Abstract:

TiO2  thin films were prepared on the glass substrate by air opened metal organic chemical vapor deposition(AP-MOCVD)with TTIP as the metal organic source.The main conditions of experiment,i.e.vaporizing temperature,substrate temperature,distance between substrate and nozzle and the N2  flow rate,were varied.

Key words: MOCVD, TiO2, substrate , temperature

CLC Number: