航空学报 > 2008, Vol. 30 Issue (6): 1687-1691

化学气相沉积TiN薄膜及其耐磨性能

苗建旺,王超,周春根   

  1. 北京航空航天大学 材料科学与工程学院
  • 收稿日期:2007-10-09 修回日期:2008-02-26 出版日期:2008-11-25 发布日期:2008-11-25
  • 通讯作者: 苗建旺

Preparation and Wear-resistant Properties of TiN Films by CVD

Miao Jianwang,Wang Chao,Zhou Chungen   

  1. School of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics
  • Received:2007-10-09 Revised:2008-02-26 Online:2008-11-25 Published:2008-11-25
  • Contact: Miao Jianwang

摘要: 采用化学气相沉积的方法制备TiN薄膜,以提高K3镍基高温合金的耐磨性能。以TiCl4 和NH3为反应气体,用化学气相沉积法(CVD) 在K3镍基高温合金基体上制备了一系列不同温度和沉积时间的TiN 薄膜。结果表明,与基体相比,沉积TiN薄膜的样品耐磨性能有显著提高。当沉积温度不变时,TiN薄膜耐磨性能随沉积时间的延长先提高后降低;当沉积时间不变时,薄膜的耐磨性能随沉积温度的升高而提高。化学气相沉积法制备TiN薄膜的最佳工艺条件为600 ℃/60 min。

关键词: TiN, 薄膜, 化学气相沉积, 硬度, 耐磨性能

Abstract: In order to improve the wear-resistance of K3Ni-based super alloy, TiN coating is deposited by chemical vapor deposition (CVD) method at different temperatures and deposite times. The reactant gas is TiCl4/NH3. Results show that the wear resistance of the alloys deposited with TiN is greatly improved compared with those alloy without TiN films. At a set deposition temperature, the wear resistance of TiN coatings becomes better at first and then decreases with increasing deposition time. With the same deposition time, the wear resistance becomes better and better with the increasing of temperature .The best deposition condition is obtained at 600 ℃/60 min.

Key words: TiN, film, chemical vapor deposition, hardness, wear resistance

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